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Am 07.10.2008 besuchen wir die Messe.

On 07.10.2008 we visit the exhibition.

07.10.2008 мы посетим выставку.

Semiconductor news

Double patterning lithography: The bridge between low k1 ArF and EUV
Jo Finders, ASML, LA Veldhoven, The Netherlands, Mircea Dusa, ASML US Inc.

PEB plate optimization for CD uniformity
Kirsten Ruck, Heiko Weichert, Tokyo Electron Europe Ltd, Dresden, Germany Steffen Hornig, Frank Finger, Göran Fleischer, Qimonda Dresden GmbH & Co.

The Lithography Expert Focus averaging
Whether intentional or not, it is common for photoresist to be exposed by an image that is actually some average of images through focus.